| 氧化铟锡薄膜熔化阈值的研究 |
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| 引用本文： | 沈斌,杨扬.氧化铟锡薄膜熔化阈值的研究[J].价值工程,2012,31(31):32-34. |
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| 作者姓名： | 沈斌 杨扬 |
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| 作者单位： | 同济大学中德学院,上海,200092 |
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| 摘 要： | 太阳能电池薄膜在平板显示器的生产中得到大量应用。而这其中Indium Tin Oxide(ITO)薄膜是应用最广的透明半导体薄膜之一。本文主要针对ITO薄膜在超短波激光烧蚀下的熔化规律进行研究。论文通过一系列激光实验,目的在于找出ITO薄膜在远红外激光下熔化现象的基本物理机制和熔蚀过程。经过实验,找出了在不同激光能量密度下,熔化阈值能量密度和熔化率,以及薄膜厚度与阈值能量密度之间的关系。
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| 关 键 词： | 太阳能电池 ITO薄膜 激光直写技术 超短波激光烧蚀 阈值能量密度 |
Study on the Melting Threshold of IDO Film |
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| SHEN Bin
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YANG Yang.Study on the Melting Threshold of IDO Film[J].Value Engineering,2012,31(31):32-34. |
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| Authors: | SHEN Bin YANG Yang |
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| Institution: | SHEN Bin; YANG Yang(Chinesech-Deutsches Hochschulkolleg,Tongji University,Shanghai 200092,China) |
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| Abstract: | Solar cell film has been widely used in the production of flat panel displays.And the ITO film is one of the most widely transparent semiconductor films.This paper mainly studied the melting law of ITO film under ultrashort wave laser ablation.Through a series of laser experiments,this paper aimed to identify the basic physical mechanisms and melting and ablation process of ITO film in the far-infrared laser.After the experiment,this paper identified the melting threshold energy density and the melting rate under different laser energy density and the relationship between the film thickness and the threshold energy density. |
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| Keywords: | solar cells ITO film laser direct writing ultrashort wave laser ablation threshold energy density |
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