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NiosⅡ处理器在透镜中心厚度测量系统中的应用设计
引用本文:王青松.NiosⅡ处理器在透镜中心厚度测量系统中的应用设计[J].价值工程,2010,29(25):161-162.
作者姓名:王青松
作者单位:西安工业大学光电工程学院,西安,710032
摘    要:采用迈克尔逊干涉仪原理测量透镜中心厚度的方法已经得到了理论论证,具有较高的测量精度。本文采用硅光电池对经透镜厚度调制后的激光干涉条纹能量进行测量,设计了前置放大电路、A/D转换电路、按键电路、LED显示电路、并以FPGA为载体设计了NiosⅡ处理器,结合软件设计构成了一个以NiosⅡ处理器为核心的透镜中心厚度测量系统的数据采集,分析和显示子系统。

关 键 词:NiosⅡ  硅光电池  迈克尔逊干涉仪

Application Design of Nios Ⅱ Processor in Measurement System of Center Thickness of Lens
Wang Qingsong.Application Design of Nios Ⅱ Processor in Measurement System of Center Thickness of Lens[J].Value Engineering,2010,29(25):161-162.
Authors:Wang Qingsong
Institution:Wang Qingsong ( School of Photoelectric Engineering, Xi ' an Technological University, Xi ' an 710032, China )
Abstract:The method that the center thickness of lens is measured by means of Michelson's interferometer has theoretical proof, which has high measurement precision. A subsystem of the center thickness of lens measurement system is designed, in which the Nios Ⅱ processor is core. Because this subsystem consists of photocell which measure laser interference fringes energy that has been modulated by the center thickness of lens, analog to digital conversion circuit, key circuit, LED display circuit, Nios H processor based on FPGA, measurement software ,it has the functions of data acquirement, date analysis and result display.
Keywords:Nios Ⅱ  nhotocell  Michelson's interferometer
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