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A systematic approach for integrated trend analysis—The case of etching
Authors:Feng-Shang WuAuthor VitaeChun-Chi HsuAuthor Vitae  Pei-Chun LeeAuthor Vitae  Hsin-Ning SuAuthor Vitae
Institution:
  • a Graduate Institute of Technology and Innovation Management, National Chengchi University, 64, Sec. 2, Chih-nan Rd., Wenshan, Taipei, 116, Taiwan
  • b Science and Technology Policy Research and Information Center, National Applied Research Laboratories, 14F, No. 106, Sec. 2, He-Ping E. Rd., Taipei, 106, Taiwan
  • c SPRU—Science and Technology Policy Research, The Freeman Centre, University of Sussex, Brighton, BN1 9QE, UK
  • Abstract:Understanding technology development trends is of critical importance to countries, industries and enterprises to be sustainable in global competition. Attempts have been made to establish trend analysis by bibliometric and patent analyses. Also text-mining uncovers hidden and important information from structured or unstructured documents which serve as knowledge carriers. This study aims to provide a systematic approach for integrated trend analysis that takes into account bibliometric analysis, patent analysis and text-mining analysis. Etching is selected as the case study for integrating trend analysis method proposed in this study. Also, validity and applicability of the integrated analysis are evaluated.
    Keywords:Bibliometric analysis  Patent analysis  Text-mining  Trend analysis  Etching
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