从ASML和Nikon专利诉讼案例看国产光刻设备知识产权建设

光刻设备是集成电路（IC）制造的核心设备，是高科技强国的战略性产品，也是当前国际科技竞争的主要战场和博弈焦点。目前，全球的高端光刻机市场已被荷兰ASML公司垄断，且其具备严密的全球知识产权布局。而光刻设备的国产替代作为市场后入者，知识产权建设起步晚，并不占据优势地位。通过对光刻领域两大国际巨头ASML和Nikon在各自产品发展过程中不同阶段发生的专利诉讼案例的全面分析，探究在集成电路（或半导体）这样的技术密集型产业领域，知识产权诉讼中国际行业巨头常用的策略和技巧，进而得到对国产光刻装备知识产权建设的重要启示。

The Intellectual Property Construction of Domestic Lithography Equipment from the Case of ASML and Nikon Patent Litigation

Lithography machines are core equipments for manufacturing integrated circuits (IC) and strategic products of high-tech powers. They are also the main battlefield and game focus of current technological competition internationally. At present, the global high-level lithography machines market has been monopolized by the Dutch ASML, and it has a strict and worldwide intellectual property layout in this field. As a latecomer to the market, the intellectual property construction about the domestic lithography machines started late and does not occupy an advantageous position. Through the comprehensive analysis of patent litigation cases between the two major giants ASML and Nikon in the field of lithography internationally that occurred in different stages during the development of their products, this paper explore the strategies and techniques commonly used by international industry giants in intellectual property litigation for technology-intensive industries as integrated circuits (or semiconductors), and then gain some important inspirations for the intellectual property construction of domestic lithography equipment.