| In_2O_3基透明导电薄膜的生长技术 |
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| 引用本文： | 徐莉,修显武,李玉国. In_2O_3基透明导电薄膜的生长技术[J]. 价值工程, 2013, 0(30): 36-38 |
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| 作者姓名： | 徐莉 修显武 李玉国 |
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| 作者单位： | 1. 山东电子职业技术学院,济南,250200
2. 山东师范大学,济南,250014 |
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| 摘 要： | 透明导电氧化物(TCO)同时具有良好的金属导电性和较高的可见光透过率,近年来在光电器件领域,特别是平板显示和薄膜太阳能电池上得到广泛的应用。其中In2O3基薄膜应用技术最为成熟。本文主要报道In2O3基薄膜的制备与退火处理的研究现状。
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| 关 键 词： | 真空蒸镀 溅射 脉冲激光沉积 溶胶-凝胶 退火 |
The Growth Technology of In2O3 Transparent Conductive Oxide Films |
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| XU Li , XIU Xian-wu , LI Yu-guo. The Growth Technology of In2O3 Transparent Conductive Oxide Films[J]. Value Engineering, 2013, 0(30): 36-38 |
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| Authors: | XU Li XIU Xian-wu LI Yu-guo |
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| Affiliation: | XU Li,XIU Xian-wu,LI Yu-guo |
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| Abstract: | The transparent conductive oxide （TCO） films have the combination of good metallic conductivity and high transmittance in the visible spectra, so these films were widely used in all types of flat panel displays and thin films solar cells. The well-known In2O3 based films are the most intense researched in nowadays. This paper reports the development of the producing technique and annealing properties in laboratories. |
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| Keywords: | vacuum evaporation sputtering pulsed laser deposition sol-gel anneal |
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