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3 mm波基片精蚀工艺研究
引用本文:詹为宇. 3 mm波基片精蚀工艺研究[J]. 国际商务研究, 2001, 41(1): 88-91
作者姓名:詹为宇
作者单位:信息产业部电子第十研究所!高级工程师,成都610036
摘    要:本文分析了在3mm波基片精蚀工艺研究中发现的问题和解决问题的办法,找出了一条利用现有微波生产设备进行毫米波基片研制的途径。

关 键 词:毫米波工艺 毫米波基片 精蚀工艺 微电子

The Research for 3 mm Wave Circuit Thin Piece About Accurate Etching Techndogy
Zhan Weiyu. The Research for 3 mm Wave Circuit Thin Piece About Accurate Etching Techndogy[J]. International Business Research, 2001, 41(1): 88-91
Authors:Zhan Weiyu
Affiliation:The Electronic 10th Institute of Ministry of Information Industry
Abstract:This article analysed the problems that werefonnd in the accurate etching technological research for three-millimeter wave circuit and have found the process to solve the problems.Wehave fonml a process that make use of the present instruments of microwave manufactnre to develop new base thin piece for millimeter wave circuit ancl have obtained a nice economic and social bemmifits.
Keywords:Millimeter wave technology  The base thin piece for millimeter wave circuit  Accurate etching process  
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