| ITO废靶回收再生技术 |
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| 引用本文： | 侬健桃,黄瀚. ITO废靶回收再生技术[J]. 中国资源综合利用, 2005, 0(2): 14-16 |
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| 作者姓名： | 侬健桃 黄瀚 |
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| 作者单位： | 广西冶金研究院,广西,南宁,530023 |
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| 摘 要： | 用磁控溅射法制备ITO膜所留下的ITO废靶料是一种经高压高温成型的铟、锡氧化物陶瓷烧结体,它耐腐蚀耐高温,但富含稀有金属铟,其回收再生技术特别是其中的铟、锡分离复杂,本文介绍几种回收方法并加以评述.
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| 关 键 词： | ITO废靶 铟 回收 |
| 文章编号： | 1008-9500(2005)02-0014-04 |
| 修稿时间： | 2004-08-11 |
The Technology of Recycling Indium from ITO Waste Target |
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| Nong Jiantao,Huang Han. The Technology of Recycling Indium from ITO Waste Target[J]. China Resources Comprehensive Utilization, 2005, 0(2): 14-16 |
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| Authors: | Nong Jiantao Huang Han |
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| Abstract: | ITO waste targets left after preparing ITO film in Magnetron Sputtering is a Tin-Indium oxide sinter formed by high temperature and high pressure.It is high temperature resistant and corrosion resistant,but concentrates Indium.The technology of recycling Indium from the target and separating Indium is very complex.This paper introduces some technology in recycling Indium from the waste target. |
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| Keywords: | ITO waste target indium recycling |
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